Craft manufacturing


Targets are key materials used in thin film preparation processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD).

 

Compared with other coating technologies, the advantage of magnetron sputtering is that a wide range of materials can be made into targets. Almost all metals, alloys and ceramic materials can be made into targets; under appropriate conditions, multi-target co-sputtering method , alloys with precise and constant proportions can be deposited; oxygen, nitrogen or other active gases are added to the sputtering discharge atmosphere to deposit reaction products between the target material and the gas.

 

The manufacturing process of sputtering targets mainly includes vacuum smelting, powder metallurgy, isostatic pressing and hot pressing sintering.

 

The following is a general description of the metal target manufacturing process:

1. Target material selection: Select suitable metal elements or alloys as materials according to the required film composition and properties. This is usually based on a comprehensive consideration of the material's physical and chemical properties, evaporation performance and cost.

2. Raw material preparation: Cut the selected metal material into blocks or powder of appropriate size. During this preparation, pretreatment may be required to remove impurities, oxides, or other surface contaminants.

3. Material cleaning: Metal materials need to be thoroughly cleaned to ensure that the content of impurities and oxides appearing on the target is as low as possible. The cleaning process can include a variety of methods, such as solution cleaning, ultrasonic cleaning, and chemical cleaning.

4. Target forming: Metal materials are made into the required shape and size through metallurgical processing methods (such as smelting casting, hot pressing sintering, powder metallurgy, isostatic pressing, etc.). This may involve steps such as forging, extrusion, rolling, heat treatment and machining to ensure the uniformity, density and structural stability of the target material.

5. Surface treatment: During the target preparation process, surface treatment may also be required to increase the adhesion between the target and the base material. This can include methods such as chemical treatment, sandblasting and electrical discharge machining.

6. Final inspection: Strict quality inspection is carried out on the prepared metal targets to ensure that they meet the required chemical composition, size, shape and purity requirements. This can be done through methods such as chemical analysis, physical property testing and microscopic observation.

7. Packaging and storage: The metal target is properly packaged to prevent contamination and damage, and then stored in a dry, dust-free and vacuum environment to ensure the stability of its quality and performance.

 

The above is a general description of the metal target manufacturing process. Specific process details may vary depending on material type, application requirements and preparation equipment. For high-purity and high-performance target preparation, more complex and sophisticated process control and processing steps may be required.

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